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Recent advancements in technology of compact laser plasma EUV sources

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F10%3A00369483" target="_blank" >RIV/68407700:21340/10:00369483 - isvavai.cz</a>

  • Result on the web

    <a href="https://doi.org/10.1117/12.841715" target="_blank" >https://doi.org/10.1117/12.841715</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1117/12.841715" target="_blank" >10.1117/12.841715</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Recent advancements in technology of compact laser plasma EUV sources

  • Original language description

    The recent advancements in technology of compact laser plasma EUV sources based on a gas puff target are presented in the paper. The sources have been developed for application in processing materials using EUV radiation in the wavelength range from about 5 nm to about 50 nm that is efficiently produced in result of irradiation a double-stream gas puff target with high-intensity laser pulses from a Nd:YAG laser (0.8 J/4 ns/10 Hz). The sources can be equipped with two various grazing incidence optical systems to focus EUV radiation: an axisymmetrical ellipsoidal mirror or a multifoil mirror system of the "lobster eye" type. A new design of the laser plasma EUV source dedicated for micro- and nanoprocessing polymers and modification of polymer surfaces is presented for the first time.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

  • OECD FORD branch

    10306 - Optics (including laser optics and quantum optics)

Result continuities

  • Project

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2010

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Proc. SPIE 7584, Laser Applications in Microelectronic and Optoelectronic Manufacturing XV

  • ISBN

    978-0-8194-7980-8

  • ISSN

    0277-786X

  • e-ISSN

    1996-756X

  • Number of pages

    8

  • Pages from-to

  • Publisher name

    SPIE

  • Place of publication

    Bellingham (stát Washington)

  • Event location

    San Francisco, CA

  • Event date

    Jan 23, 2010

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article

    000285578500013