Recent advancements in technology of compact laser plasma EUV sources
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F10%3A00369483" target="_blank" >RIV/68407700:21340/10:00369483 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1117/12.841715" target="_blank" >https://doi.org/10.1117/12.841715</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1117/12.841715" target="_blank" >10.1117/12.841715</a>
Alternative languages
Result language
angličtina
Original language name
Recent advancements in technology of compact laser plasma EUV sources
Original language description
The recent advancements in technology of compact laser plasma EUV sources based on a gas puff target are presented in the paper. The sources have been developed for application in processing materials using EUV radiation in the wavelength range from about 5 nm to about 50 nm that is efficiently produced in result of irradiation a double-stream gas puff target with high-intensity laser pulses from a Nd:YAG laser (0.8 J/4 ns/10 Hz). The sources can be equipped with two various grazing incidence optical systems to focus EUV radiation: an axisymmetrical ellipsoidal mirror or a multifoil mirror system of the "lobster eye" type. A new design of the laser plasma EUV source dedicated for micro- and nanoprocessing polymers and modification of polymer surfaces is presented for the first time.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
—
OECD FORD branch
10306 - Optics (including laser optics and quantum optics)
Result continuities
Project
—
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proc. SPIE 7584, Laser Applications in Microelectronic and Optoelectronic Manufacturing XV
ISBN
978-0-8194-7980-8
ISSN
0277-786X
e-ISSN
1996-756X
Number of pages
8
Pages from-to
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Publisher name
SPIE
Place of publication
Bellingham (stát Washington)
Event location
San Francisco, CA
Event date
Jan 23, 2010
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000285578500013