Numerical Modeling of Thermal Response of Molybdenum Thin Film on Different Substrates Irradiated by Short Laser Pulse

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F21%3A00352888" target="_blank" >RIV/68407700:21340/21:00352888 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Numerical Modeling of Thermal Response of Molybdenum Thin Film on Different Substrates Irradiated by Short Laser Pulse
Original language description
Heterostructures consisting of a thin metallic film deposited on a dielectric or semiconducting substrate are employed in a number of applications in the field of optoelectronics, photovoltaics, nanoparticle production and in laser-induced forward transfer (LIFT). These thin films are often processed using ultra-short laser pulses. However, the type of substrate where they are deposited may affect the temperature evolution upon the laser exposure and the resulting structure. The numerical model, which includes temperature-dependent properties of substrate materials and molybdenum, was validated by controlling the energy conservation and by comparing with the experimental melting threshold fluences of Mo films for film thicknesses from 5 to 200 nm.
Czech name
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Czech description
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Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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