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Performance studies of the CE-65v2 MAPS prototype structure

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F25%3A00390369" target="_blank" >RIV/68407700:21340/25:00390369 - isvavai.cz</a>

  • Result on the web

    <a href="https://doi.org/10.1088/1748-0221/20/03/C03033" target="_blank" >https://doi.org/10.1088/1748-0221/20/03/C03033</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1088/1748-0221/20/03/C03033" target="_blank" >10.1088/1748-0221/20/03/C03033</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Performance studies of the CE-65v2 MAPS prototype structure

  • Original language description

    With the next upgrade of the ALICE inner tracking system (ITS3) as its primary focus, a set of small MAPS test structures have been developed in the 65 nm TPSCo CMOS process. The CE-65 focuses on the characterisation of the analogue charge collection properties of this technology. The latest iteration, the CE-65v2, was produced in different processes (Standard, with a low-dose n-type blanket, and blanket with gap between pixels), pixel pitches (15, 18, 22.5 mu m) and pixel arrangements (square or staggered). The comparatively large pixel array size of 48 x 24 pixels in CE-65v2 allows the uniformity of the pixel response to be studied, among other benefits. The CE-65v2 chip was characterised in a test beam at the CERN SPS. A first analysis showed that hit efficiencies of >= 99% and spatial resolution better than 5 mu m can be achieved for all pitches and process variants. For the Standard process, thanks to larger charge sharing, even spatial resolutions below 3 mu m are reached, in line with vertex detector requirements for the FCC-ee. This contribution further investigates the data collected at the SPS test beam. Thanks to the large sensor size and efficient data collection, a large amount of statistics was collected, which allows for detailed in-pixel studies to see the efficiency and spatial resolution as a function of the hit position within the pixels. Again, different pitches and process variants are compared.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10303 - Particles and field physics

Result continuities

  • Project

  • Continuities

Others

  • Publication year

    2025

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Journal of Instrumentation

  • ISSN

    1748-0221

  • e-ISSN

    1748-0221

  • Volume of the periodical

    20

  • Issue of the periodical within the volume

    3

  • Country of publishing house

    GB - UNITED KINGDOM

  • Number of pages

    9

  • Pages from-to

    1-9

  • UT code for WoS article

    001454234600001

  • EID of the result in the Scopus database

    2-s2.0-105000416461