Physical and Photocatalytic Properties of Laser Fabricated Crystalline TiO2 at Low Temperatures

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21460%2F10%3A00169020" target="_blank" >RIV/68407700:21460/10:00169020 - isvavai.cz</a>

Alternative codes found

RIV/68378271:_____/10:00349017

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Physical and Photocatalytic Properties of Laser Fabricated Crystalline TiO2 at Low Temperatures

Original language description

We report on an extensive study of the deposition of titanium dioxide layers by pulsed laser deposition at either room temperature or at 200°C (300°C, 400°C, 500°C) from pure titanium and titanium dioxide targets. Some amorphous samples were annealed bythe rapid thermal annealing method. The study is focused on the effect of variation of pressure of the reactive oxygen and the inert argon atmospheres, and the mixtures of both.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BH - Optics, masers and lasers

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2010

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Optoelectronics and Advanced Materials

ISSN

1454-4164

e-ISSN

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Volume of the periodical

12

Issue of the periodical within the volume

3

Country of publishing house

RO - ROMANIA

Number of pages

4

Pages from-to

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UT code for WoS article

000277827900068

EID of the result in the Scopus database

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