Photocatalytic and wettability properties of Titanium dioxide thin films prepared at low temperatures by Pulsed laser deposition

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21460%2F10%3A00179105" target="_blank" >RIV/68407700:21460/10:00179105 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Photocatalytic and wettability properties of Titanium dioxide thin films prepared at low temperatures by Pulsed laser deposition
Original language description
The titanium dioxide thin layers were prepared by pulsed laser deposition. The best deposition conditions for the grow of anatase and rutile phase were searched for and photocatalytic activity was determined. The photocatalytic properties were probed bytwo independent methods and results were compared. Same samples were prepared with radio-frequency (13,56 MHz) discharge burns in deposition chamber. The substrate temperature was decreased step by step from 500°C to room temperature. Possibilities of use contact angle and free surface energy to determine crystalline phase and amount of phase in samples was studied too.
Czech name
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Czech description
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Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
POSTER 2010 - Proceedings of the 14th International Conference on Electrical Engineering
ISBN
978-80-01-04544-2
ISSN
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e-ISSN
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Number of pages
4
Pages from-to
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Publisher name
ČVUT v Praze, FEL
Place of publication
Praha
Event location
Praha
Event date
May 6, 2010
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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