REACTIONS OF SILICON CARBIDE IN WATER-STABILIZED PLASMA

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21610%2F24%3A00389540" target="_blank" >RIV/68407700:21610/24:00389540 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
REACTIONS OF SILICON CARBIDE IN WATER-STABILIZED PLASMA
Original language description
Silicon carbide (SiC) possesses a range of extreme physicochemical properties that make it suitable for applications across various industrial sectors. At normal or slightly elevated temperatures, it is used in engineering as an abrasive or machining material and finds applications in optics, electronics, and electrical engineering. Its high corrosion resistance and particularly its radiation stability are also utilized in the construction of equipment exposed to nuclear fuel or directly within nuclear reactors. However, its behaviour at extremely high temperatures, oxidation phase, or structural transformations and inconsistent thermal decomposition pose challenges. Published data on these properties are highly contradictory due to the experimental difficulty in studying materials at temperatures above 3000 K. This article describes the behaviour of silicon carbide in the plasma generated by a hybrid water-stabilized plasma torch WSP-H 500, capable of achieving temperatures up to 25000 K at its output. The study focuses on the products formed during the deposition of powdered SiC on graphite substrates, aiming to elucidate the differences between passive and active oxidation of SiC, which are attributed in literature to the presence of volatile and unstable Si2O2 molecules formed at extreme temperatures.
Czech name
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Czech description
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Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2024
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings of the 11th International Conference on Chemical Technology
ISBN
978-80-88307-21-1
ISSN
2336-811X
e-ISSN
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Number of pages
6
Pages from-to
130-135
Publisher name
Česká společnost chemická
Place of publication
Praha
Event location
Mikulov
Event date
Apr 15, 2024
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
001678797800022

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