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Mechanical strain and electric-field modulation of graphene transistors integrated on MEMS cantilevers

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F70883521%3A28110%2F22%3A63548719" target="_blank" >RIV/70883521:28110/22:63548719 - isvavai.cz</a>

  • Alternative codes found

    RIV/00216305:26620/22:PU142766

  • Result on the web

    <a href="https://link.springer.com/article/10.1007%2Fs10853-021-06846-6" target="_blank" >https://link.springer.com/article/10.1007%2Fs10853-021-06846-6</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1007/s10853-021-06846-6" target="_blank" >10.1007/s10853-021-06846-6</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Mechanical strain and electric-field modulation of graphene transistors integrated on MEMS cantilevers

  • Original language description

    This work proposes a structure which allows characterization of graphene monolayers under combined electric field and mechanical strain modulation. Our approach is based on a cantilever integrated into a two-dimensional graphene-based Field effect transistor (FET). This allows us to change graphene properties either separately or together via two methods. The first way involves electric field induced by the gate. The second is induction of mechanical strain caused by external force pushing the cantilever up or down. We fabricated devices using silicon-on-insulator wafer with practically zero value of residual stress and a high-quality dielectric layer which allowed us to precisely characterize structures using both mentioned stimuli. We used the electric field/strain interplay to control resistivity and position of the charge neutrality point often described as the Dirac point of graphene. Furthermore, values of mechanical stress can be obtained during the preparation of thin films, which enables the cantilever to bend after the structure is released. Our device demonstrates a novel method of tuning the physical properties of graphene in silicon and/or complementary metal-oxide-semiconductor technology and is thus promising for tunable physical or chemical sensors.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Result continuities

  • Project

  • Continuities

    V - Vyzkumna aktivita podporovana z jinych verejnych zdroju

Others

  • Publication year

    2022

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Journal of Materials Science

  • ISSN

    0022-2461

  • e-ISSN

  • Volume of the periodical

    57

  • Issue of the periodical within the volume

    Neuveden

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    13

  • Pages from-to

    "1923–1935"

  • UT code for WoS article

    000739772900001

  • EID of the result in the Scopus database

    2-s2.0-85122377631