isvav_result

publication_year

occurrences__organization__code

solver__id__sc2

result_type__code

Type of result according to the RIV classification. Czech version is available <a href="https://www.vyzkum.cz/FrontClanek.aspx?idsekce=1395" target="_blank" >here</a>.

language__code

Jazyk výsledku udáva původní jazyk, ve kterém byl daný výsledek vytvořen. Kompletní seznam jazyků ve kterém je možno výsledek do RIV předložit je <a href="https://www.vyzkum.cz/FrontClanek.aspx?idsekce=1397" target="_blank" >zde</a>.

cep__code

ford__code

_group_id67

occurrences__funder__code

Data supplier is the R&D aid provider who supported this result.

project__programme__code

x_range_count_solvers

project__id

What are you looking for?

Quick search

Smart search

Filters

In situ Quartz Crystal Microbalance Measurements of Thin Protein Film Plasma Removal

In-situ monitoring of etching of bovine serum albumin using low-temperature atmospheric plasma jet

Nanostructuring of diamond films using self-assembled nanoparticles

Effect of plasma treatment on the surface morphology and wettability of (111) and (100) silicon wafers

Permanent Plasma Surface Functionalization of Internal Surface Areas

Etching of GeSe2 chalcogenide glass and its pulsed laser deposited thin films in SF6, SF6/Ar and SF6/O2 plasmas

The transport and surface reactivity of O atoms during the atmospheric plasma etching of hydrogenated amorphous carbon films

Stability of masking materials for pattern transfer of lithographic masks into fused silica by atmospheric pressure plasma jet etching

Towards Surface-Friendly Treatment of Seeding Layer and Selected-Area Diamond Growth

Roll-to-roll surface etching of polymers using hydrogen plasma at atmospheric pressure