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Impact of neutral gas temperatures on reactive magnetron sputtering
Temperature is an important parameter which influences whole sputtering process. A model of reactive magnetron sputtering was used to investigate an effect of different temperatures in reactor during reactive sputtering...
BL - Fyzika plasmatu a výboje v plynech
- 2010 •
- D
Rok uplatnění
D - Stať ve sborníku
The Effects of Plasma Properties of Sputtered Selflubricating Coatings
The selflubricating coatings prepared by magnetron sputtering are based properties. This paper presents some results of the study of sputtering processes of based coatings.The comparison of frictional properties of the sputtered...
JK - Koroze a povrchové úpravy materiálu
- 2001 •
- D
Rok uplatnění
D - Stať ve sborníku
The influence of deposition parameters on structure and deposition rates of Al films prepared by magnetron sputtering
The paper deals with the evaluation of aluminium thin films properties prepared by fr and dc magnetron sputtering techniques. Structural and optical properties of deposited films were characterized in relation to type of the source, sput...
BL - Fyzika plasmatu a výboje v plynech
- 2007 •
- D
Rok uplatnění
D - Stať ve sborníku
Surface Morphology of Magnetron Sputtered TiO2 Films
parameters, structure, and surface morphology of sputtered TiO2 films prepared by magnetron sputtering. It has been found that the increase in the partial pressure structure. Maximum surface roughness was observed for film...
BL - Fyzika plasmatu a výboje v plynech
- 2007 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Reactive Magnetron Sputtering of the Aluminium Oxide Coating
This contribution deals with design, check and test of deposition parameters for new installed aluminium target. In addition of individual parts of deposition process and hysteresis of sputtering thin films of Al2O3 was verified. Th...
JA - Elektronika a optoelektronika, elektrotechnika
- 2016 •
- D •
- Link
Rok uplatnění
D - Stať ve sborníku
Výsledek na webu
Evolution of discharge parameters and sputtered species ionization in reactive HiPIMS with oxygen, nitrogen and acetylene
parameters such as total pressure, discharge current and sputtered species numberReactive high power impulse magnetron sputtering offers a great opportunity. The experiments are compared to the reactive direct current magn...
Fluids and plasma physics (including surface physics)
- 2019 •
- Jimp •
- Link
Rok uplatnění
Jimp - Článek v periodiku v databázi Web of Science
Výsledek na webu
The Nonconductive Sputtered Thin Film Layer
technology, specifically by sputtering. Set of samples of thin film capacitors layer. Dielectric layers were deposited by sputtering of Al2O3on glass substrate. The measured parameters were the electrica...
Electrical and electronic engineering
- 2019 •
- Jost •
- Link
Rok uplatnění
Jost - Ostatní články v recenzovaných periodicích
Výsledek na webu
The Influence of Technological Process on Properties of Thin Film Capacitors
by sputtering technology. The dielectric layer made from corundum and aluminum nitride were prepared and analyzed. Dependence of properties (capacity) on parameters of technological process of deposition of layer was analyzed. ...
JA - Elektronika a optoelektronika, elektrotechnika
- 2008 •
- D
Rok uplatnění
D - Stať ve sborníku
In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film
are in the case of RF magnetron sputtering closely related to plasma parameters. The sputtering process and the film growth are significantly influenced by the mass ratio of deposited atoms and sputtering gas ions...
BM - Fyzika pevných látek a magnetismus
- 2011 •
- O
Rok uplatnění
O - Ostatní výsledky
Modelling of sputtering yield amplification effect in reactive deposition of oxides
Many reactive sputter deposition applications require high deposition rates. The primary limiting parameters in magnetron sputtering are the target power dissipation and sputtering yields of the target elements. In...
BL - Fyzika plasmatu a výboje v plynech
- 2010 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
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