In?uence of substrate material on plasma in deposition/sputtering reactor: experiment and computer simulation

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00177016%3A_____%2F08%3A%230000300" target="_blank" >RIV/00177016:_____/08:#0000300 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

In?uence of substrate material on plasma in deposition/sputtering reactor: experiment and computer simulation

Original language description

The aim of this work was to investigate the in?uence of the substrate material on the plasma enhanced chemical vapour deposition and the plasma sputtering of thin ?lms in low pressure (3?20 Pa) parallel-plate radio frequency (rf) discharges. It was observed that the deposition or sputtering rates differed above different materials, e.g. above a substrate and substrate electrode. Moreover, the substrates placed on the bottom rf electrode seemed to be mirrored in the thickness of a thin ?lm deposited or sputtered on the upper grounded electrode. The in?uence of the substrate material on the plasma parameters was studied via particle in cell/Monte Carlo computer simulation. According to our ?nding the mirroring of the substrate was caused by different secondary electron emission yields of the substrate material and material of the substrate electrode.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2008

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Physics D

ISSN

0022-3727

e-ISSN

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Volume of the periodical

41

Issue of the periodical within the volume

05

Country of publishing house

GB - UNITED KINGDOM

Number of pages

8

Pages from-to

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UT code for WoS article

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EID of the result in the Scopus database

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