Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films
Result description
Titanium dioxide films have many remarkable properties, for example photocatalytic activity and hydrophilicity. However, these properties depend significantly on the crystallinity, phase composition and microstructure of the films. In this study, crystallization of amorphous films with different thickness (50-2000 nm) deposited on silicon substrates was investigated by XRD in-situ isochronal and isothermal annealing at different temperatures and compared with the post-annealing of both amorphous and nanocrystalline films. It was found that the crystallization depends strongly on the film thickness, especially below about 500 nm and it is slow for very thin films. The process can be well described by the Avrami equation modified by the initial time of crystallization. The parameters of the equation depend on the film thickness.
Keywords
thicknessdependencecrystallizationamorphousmagnetrondepositedfilms
The result's identifiers
Result code in IS VaVaI
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films
Original language description
Titanium dioxide films have many remarkable properties, for example photocatalytic activity and hydrophilicity. However, these properties depend significantly on the crystallinity, phase composition and microstructure of the films. In this study, crystallization of amorphous films with different thickness (50-2000 nm) deposited on silicon substrates was investigated by XRD in-situ isochronal and isothermal annealing at different temperatures and compared with the post-annealing of both amorphous and nanocrystalline films. It was found that the crystallization depends strongly on the film thickness, especially below about 500 nm and it is slow for very thin films. The process can be well described by the Avrami equation modified by the initial time of crystallization. The parameters of the equation depend on the film thickness.
Czech name
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Czech description
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Classification
Type
Jx - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
GA106/06/0327: Crystallization of amorphous and nanocrystalline thin films
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Zeitschrift für Kristallographie
ISSN
0044-2968
e-ISSN
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Volume of the periodical
Neuveden
Issue of the periodical within the volume
neuveden
Country of publishing house
DE - GERMANY
Number of pages
6
Pages from-to
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UT code for WoS article
000271325700003
EID of the result in the Scopus database
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Result type
Jx - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP
BM - Solid-state physics and magnetism
Year of implementation
2009