The Computational Simulation of the Positive Ion Propagation to Uneven Substrates
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F11%3A10109812" target="_blank" >RIV/00216208:11320/11:10109812 - isvavai.cz</a>
Result on the web
<a href="http://www.mff.cuni.cz/veda/konference/wds/proc/pdf11/WDS11_219_f2_Hruby.pdf" target="_blank" >http://www.mff.cuni.cz/veda/konference/wds/proc/pdf11/WDS11_219_f2_Hruby.pdf</a>
DOI - Digital Object Identifier
—
Alternative languages
Result language
angličtina
Original language name
The Computational Simulation of the Positive Ion Propagation to Uneven Substrates
Original language description
The low-temperature plasma is commonly used to treat the surfaces of a wide range of substrates. The deposition of layers on the surfaces of conductive substrates may be achieved by various ways. In comparison with neutral atom deposition, the use of ions has got considerable advantages. The energy of ions and the flux to the substrate can be controlled by the voltage bias and the pressure. in this contribution, the propagation of ions from low-temperature plasma to substrates with uneven surfaces is studied by means of computational simulations. Instead of simulating the whole system of discharge, sputtering and deposition, this study is devoted to the transport of ions to a complex substrate, which demands the fully three-dimensional approach, independently of the source of plasma. The computational simulations are based on a hybrid model which consists of a fluid and a particle part trying to take advantage from both of them. The fluid part reaches the global results in a short time
Czech name
—
Czech description
—
Classification
Type
D - Article in proceedings
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
—
Result continuities
Project
<a href="/en/project/GD202%2F08%2FH057" target="_blank" >GD202/08/H057: Modern trends in plasma physics</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
WDS'11 Proceedings of Contributed Papers: Part II ? Physics of Plasmas and Ionized Media
ISBN
978-80-7378-185-9
ISSN
—
e-ISSN
—
Number of pages
5
Pages from-to
115-119
Publisher name
Matfyzpress
Place of publication
Praha
Event location
Praha
Event date
May 31, 2011
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
—