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The Computational Simulation of the Positive Ion Propagation to Uneven Substrates

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F11%3A10109812" target="_blank" >RIV/00216208:11320/11:10109812 - isvavai.cz</a>

  • Result on the web

    <a href="http://www.mff.cuni.cz/veda/konference/wds/proc/pdf11/WDS11_219_f2_Hruby.pdf" target="_blank" >http://www.mff.cuni.cz/veda/konference/wds/proc/pdf11/WDS11_219_f2_Hruby.pdf</a>

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    The Computational Simulation of the Positive Ion Propagation to Uneven Substrates

  • Original language description

    The low-temperature plasma is commonly used to treat the surfaces of a wide range of substrates. The deposition of layers on the surfaces of conductive substrates may be achieved by various ways. In comparison with neutral atom deposition, the use of ions has got considerable advantages. The energy of ions and the flux to the substrate can be controlled by the voltage bias and the pressure. in this contribution, the propagation of ions from low-temperature plasma to substrates with uneven surfaces is studied by means of computational simulations. Instead of simulating the whole system of discharge, sputtering and deposition, this study is devoted to the transport of ions to a complex substrate, which demands the fully three-dimensional approach, independently of the source of plasma. The computational simulations are based on a hybrid model which consists of a fluid and a particle part trying to take advantage from both of them. The fluid part reaches the global results in a short time

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GD202%2F08%2FH057" target="_blank" >GD202/08/H057: Modern trends in plasma physics</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2011

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    WDS'11 Proceedings of Contributed Papers: Part II ? Physics of Plasmas and Ionized Media

  • ISBN

    978-80-7378-185-9

  • ISSN

  • e-ISSN

  • Number of pages

    5

  • Pages from-to

    115-119

  • Publisher name

    Matfyzpress

  • Place of publication

    Praha

  • Event location

    Praha

  • Event date

    May 31, 2011

  • Type of event by nationality

    EUR - Evropská akce

  • UT code for WoS article