Growth and characterization of stacking fault reduced GaN( 1 0 1($)over-bar 3) on sapphire

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F13%3A10134082" target="_blank" >RIV/00216208:11320/13:10134082 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1088/0022-3727/46/12/125308" target="_blank" >http://dx.doi.org/10.1088/0022-3727/46/12/125308</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/0022-3727/46/12/125308" target="_blank" >10.1088/0022-3727/46/12/125308</a>

Result language
angličtina
Original language name
Growth and characterization of stacking fault reduced GaN( 1 0 1($)over-bar 3) on sapphire
Original language description
We present a transmission electron microscope (TEM) and x-ray diffraction (XRD) study of metalorganic vapor phase epitaxy grown GaN(1 0 ($) over bar1 3) layers on m-sapphire with Al(Ga) N interlayers. The interlayers are demonstrated to be beneficial inreducing the stacking fault (SF) density by more than 2.5 orders of magnitude from >2 x 106 cm(-1) to < 5 x 103 cm(-1) as determined by TEM. XRD measurements along the GaN(1 0 <($)over bar>1 2) to the GaN(1 0 ($) over bar1 5) reflection reveal a diffraction component originating in the basal plane SFs. Fitting the XRD signal enables a fast and simple determination of SF type and density which can even distinguish between the GaN buffer and the upper GaN layers and which is in reasonable agreement with TEM measurements.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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