All

What are you looking for?

All
Projects
Results
Organizations

Quick search

  • Projects supported by TA ČR
  • Excellent projects
  • Projects with the highest public support
  • Current projects

Smart search

  • That is how I find a specific +word
  • That is how I leave the -word out of the results
  • “That is how I can find the whole phrase”

Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F13%3A10191439" target="_blank" >RIV/00216208:11320/13:10191439 - isvavai.cz</a>

  • Alternative codes found

    RIV/68378271:_____/13:00393045

  • Result on the web

    <a href="http://dx.doi.org/10.1016/j.surfcoat.2013.02.012" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2013.02.012</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.surfcoat.2013.02.012" target="_blank" >10.1016/j.surfcoat.2013.02.012</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering

  • Original language description

    The effect of energetic ion bombardment on TiO2 crystallographic phase formation was studied. Films were deposited using high-power impulse magnetron sputtering (HiPIMS) assisted by an electron cyclotron wave resonance (ECWR) plasma. The ECWR assistanceallows a significant reduction of pressure down to 0.075 Pa during reactive HiPIMS deposition and subsequently enables control of the energy of the deposited species over a wide range. Films deposited at high ion energies and deposition rates form rutilewith (101) a preferred orientation. With decreasing ion energy and deposition rates, rutile is formed with random crystallite orientation, and finally at low ion energies the anatase phase occurs. It is supposed that particles gain high energy during the HiPIMS pulse while the ECWR discharge is mostly responsible for substrate heating due to dissipated power. However, the energetic contribution of the ECWR discharge is not sufficient for annealing and phase transformation.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2013

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Surface and Coatings Technology

  • ISSN

    0257-8972

  • e-ISSN

  • Volume of the periodical

    222

  • Issue of the periodical within the volume

    květen

  • Country of publishing house

    CH - SWITZERLAND

  • Number of pages

    6

  • Pages from-to

    112-117

  • UT code for WoS article

    000318135100016

  • EID of the result in the Scopus database