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A Study of Sheath in Argon Plasma Containing Sputtered Metal

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F13%3A10192277" target="_blank" >RIV/00216208:11320/13:10192277 - isvavai.cz</a>

  • Result on the web

    <a href="http://www.mff.cuni.cz/veda/konference/wds/proc/pdf13/WDS13_208_f2_Ibehej.pdf" target="_blank" >http://www.mff.cuni.cz/veda/konference/wds/proc/pdf13/WDS13_208_f2_Ibehej.pdf</a>

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    A Study of Sheath in Argon Plasma Containing Sputtered Metal

  • Original language description

    We present results of a two-dimensional particle model of plasma-solid boundary. The model follows trajectories of charged species in plasma which form sheath and pre-sheath layers in the vicinity of a biased substrate. We studied sheath parameters and particle transport through the sheath in high-density argon plasma containing sputtered metal ions. The plasma parameters were taken from a volume-averaged model of inductively coupled plasma during ionized physical vapour deposition (IPVD) using magnetron sputtering. Our model simulated the capability of IPVD to ll the high-aspect-ratio trenches and evaluated local fluxes, energy and angular distributions of ions impinging on the trench. We observed that the substrate bias influenced the energy of ionsbut not their flux. Therefore, these quantities can be regulated independently by changing bias and magnetron power.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GAP205%2F10%2F0979" target="_blank" >GAP205/10/0979: Study of the interaction of chemically active plasmas with solid surfaces at medium and higher pressures</a><br>

  • Continuities

    S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2013

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    WDS'13 Proceedings of Contributed Papers: Part II - Physics of Plasmas and Ionized Media

  • ISBN

    978-80-7378-251-1

  • ISSN

  • e-ISSN

  • Number of pages

    6

  • Pages from-to

    54-59

  • Publisher name

    Matfyzpress

  • Place of publication

    Praha

  • Event location

    Praha

  • Event date

    Jun 4, 2013

  • Type of event by nationality

    EUR - Evropská akce

  • UT code for WoS article