Computer Simulation of Metal Ions Transport to Uneven Substrates during Ionized Plasma Vapour Deposition
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F17%3A10371526" target="_blank" >RIV/00216208:11320/17:10371526 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1155/2017/4283547" target="_blank" >http://dx.doi.org/10.1155/2017/4283547</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1155/2017/4283547" target="_blank" >10.1155/2017/4283547</a>
Alternative languages
Result language
angličtina
Original language name
Computer Simulation of Metal Ions Transport to Uneven Substrates during Ionized Plasma Vapour Deposition
Original language description
We present a computational study of processes taking place in a sheath region formed near a negatively biased uneven substrate during ionized plasma vapour deposition. The sputtered metal atoms are ionized on their way to substrate and they are accelerated in the sheath near the substrate. They are able to penetrate to high-aspect-ratio structures, for example, trenches, which can be, therefore, effectively coated. The main technique used was a two-dimensional particle simulation. The results of our model predict the energy and angular distributions of impinging ions in low-pressure conditions which are characteristic for this method and where typical continuous models fail due to unfulfilled assumptions. Input bulk plasma properties were computed by a "zero dimensional" global model which took into account more physical processes important on a scale of the whole magnetron chamber. Output parameters, such as electrostatic potential, energy of ions, and ion fluxes, were computed for wide range of conditions (electron density and substrate bias) to show the influence of these conditions on observed phenomena, penetration of sheath inside the trench, deceleration of argon and copper ions inside the trench, and local maxima of ion fluxes near the trench opening.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
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Continuities
S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Advances in Materials Science and Engineering
ISSN
1687-8434
e-ISSN
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Volume of the periodical
2017
Issue of the periodical within the volume
18. října
Country of publishing house
EG - EGYPT
Number of pages
7
Pages from-to
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UT code for WoS article
000414084900001
EID of the result in the Scopus database
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