Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F16%3A00470666" target="_blank" >RIV/68378271:_____/16:00470666 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1116/1.4953033" target="_blank" >http://dx.doi.org/10.1116/1.4953033</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/1.4953033" target="_blank" >10.1116/1.4953033</a>

Result language

angličtina

Original language name

Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering

Original language description

A new planar ion flux probe, based on the Sobolewski method for time-resolved plasma characterization in inherently noisy pulsed plasma discharges, has been developed. The probe was evaluated in a high-power impulse magnetron sputtering (HiPIMS) process, which is a promising ionized physical vapor deposition technique based on pulsed plasma discharges used to engineer thin films with improved properties. Both nonreactive (pure Ar) and reactive (Ar/O-2) deposition processes were investigated using a Ti sputtering target. It was found that the process exhibited a nearly hysteresis-free and stable transition region at the chosen deposition conditions. Time-resolved measurements of the absolute ion flux impinging on the probe placed at the substrate position, as well as of the probe sheath impedance, were recorded in the metal, transition, and compound modes during the HiPIMS pulse. Gradual changes in the measured ion flux were seen when transiting from the metal mode to the compound mode.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/GA15-00863S" target="_blank" >GA15-00863S: A study of impulse plasmatic systems for deposition of thin layers with applications in photonics</a><br>

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2016

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films

ISSN

0734-2101

e-ISSN

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Volume of the periodical

34

Issue of the periodical within the volume

4

Country of publishing house

US - UNITED STATES

Number of pages

10

Pages from-to

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UT code for WoS article

000379588000011

EID of the result in the Scopus database

2-s2.0-84974602716