Plasma diagnostics in reactive high-power impulse magnetron sputtering system working in Ar + H2S gas mixture

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F20%3A00533973" target="_blank" >RIV/68378271:_____/20:00533973 - isvavai.cz</a>
Alternative codes found
RIV/00216208:11320/20:10413958
Result on the web
<a href="http://hdl.handle.net/11104/0312196" target="_blank" >http://hdl.handle.net/11104/0312196</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.3390/coatings10030246" target="_blank" >10.3390/coatings10030246</a>

Result language
angličtina
Original language name
Plasma diagnostics in reactive high-power impulse magnetron sputtering system working in Ar + H2S gas mixture
Original language description
A reactive high-power impulse magnetron sputtering system (HiPIMS) working in Ar + H2S gas mixture was investigated as a source for the deposition of iron sulfide thin films. As a sputtering material, a pure Fe target was used. Plasma parameters in this system were investigated by a time-resolved Langmuir probe, radio-frequency (RF) ion flux probe, quartz crystal monitor modified for measurement of the ionized fraction of depositing particles, and by optical emission spectroscopy.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
—
OECD FORD branch
20506 - Coating and films

Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2020
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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