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Deposition of TiO2 Nanoparticles by Means of Hollow Cathode Plasma Jet

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F13%3A10192448" target="_blank" >RIV/00216208:11320/13:10192448 - isvavai.cz</a>

  • Result on the web

    <a href="http://www.mff.cuni.cz/veda/konference/wds/proc/pdf13/WDS13_222_f2_Perekrestov.pdf" target="_blank" >http://www.mff.cuni.cz/veda/konference/wds/proc/pdf13/WDS13_222_f2_Perekrestov.pdf</a>

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Deposition of TiO2 Nanoparticles by Means of Hollow Cathode Plasma Jet

  • Original language description

    TiO2 nanoparticles have been investigated in this work. Nanoparticles were obtained in Ar plasma on monocrystaline Si(111) substrate by gas-phase deposition using hollow cathode plasma jet (HCPJ). The material of a cathode is pure titanium. Cathode's surface has a high affinity for oxygen and thus an oxide layer rapidly forms upon exposure to the atmosphere or introducing oxygen into the main chamber. Given method is based on sputtering TiO2/Ti2O3/TiO layer of a hollow cathode. The explanation of nanoparticle growth mechanism and size distribution is given. Morphology of thin film surface was investigated by means of scanning electron microscope (SEM) and atomic force microscope (AFM). We used mass spectrometer to monitor a chemical composition of thegas inside the system during deposition. The chemical composition of the thin films was investigated by means of energy dispersive x-ray analysis (EDX).

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GAP205%2F11%2F0386" target="_blank" >GAP205/11/0386: Advanced experimental research of discharge plasma sources applied for deposition of nanostructured thin films</a><br>

  • Continuities

    S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2013

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    WDS'13 Proceedings of Contributed Papers: Part II - Physics of Plasmas and Ionized Media

  • ISBN

    978-80-7378-251-1

  • ISSN

  • e-ISSN

  • Number of pages

    5

  • Pages from-to

    139-143

  • Publisher name

    Matfyzpress

  • Place of publication

    Praha

  • Event location

    Praha

  • Event date

    Jun 4, 2013

  • Type of event by nationality

    EUR - Evropská akce

  • UT code for WoS article