Deposition of TiO2 Nanoparticles by Means of Hollow Cathode Plasma Jet
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F13%3A10192448" target="_blank" >RIV/00216208:11320/13:10192448 - isvavai.cz</a>
Result on the web
<a href="http://www.mff.cuni.cz/veda/konference/wds/proc/pdf13/WDS13_222_f2_Perekrestov.pdf" target="_blank" >http://www.mff.cuni.cz/veda/konference/wds/proc/pdf13/WDS13_222_f2_Perekrestov.pdf</a>
DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Deposition of TiO2 Nanoparticles by Means of Hollow Cathode Plasma Jet
Original language description
TiO2 nanoparticles have been investigated in this work. Nanoparticles were obtained in Ar plasma on monocrystaline Si(111) substrate by gas-phase deposition using hollow cathode plasma jet (HCPJ). The material of a cathode is pure titanium. Cathode's surface has a high affinity for oxygen and thus an oxide layer rapidly forms upon exposure to the atmosphere or introducing oxygen into the main chamber. Given method is based on sputtering TiO2/Ti2O3/TiO layer of a hollow cathode. The explanation of nanoparticle growth mechanism and size distribution is given. Morphology of thin film surface was investigated by means of scanning electron microscope (SEM) and atomic force microscope (AFM). We used mass spectrometer to monitor a chemical composition of thegas inside the system during deposition. The chemical composition of the thin films was investigated by means of energy dispersive x-ray analysis (EDX).
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GAP205%2F11%2F0386" target="_blank" >GAP205/11/0386: Advanced experimental research of discharge plasma sources applied for deposition of nanostructured thin films</a><br>
Continuities
S - Specificky vyzkum na vysokych skolach
Others
Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
WDS'13 Proceedings of Contributed Papers: Part II - Physics of Plasmas and Ionized Media
ISBN
978-80-7378-251-1
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
139-143
Publisher name
Matfyzpress
Place of publication
Praha
Event location
Praha
Event date
Jun 4, 2013
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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