The deposition of titanium dioxide nanoparticles by means of a hollow cathode plasma jet in dc regime
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F15%3A10319538" target="_blank" >RIV/00216208:11320/15:10319538 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1088/0963-0252/24/3/035025" target="_blank" >http://dx.doi.org/10.1088/0963-0252/24/3/035025</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/0963-0252/24/3/035025" target="_blank" >10.1088/0963-0252/24/3/035025</a>
Alternative languages
Result language
angličtina
Original language name
The deposition of titanium dioxide nanoparticles by means of a hollow cathode plasma jet in dc regime
Original language description
TiO2 nanoparticles are being investigated in this work. Nanoparticles were obtained in Ar plasma on monocrystaline Si(111) substrate by means of a gas-phase deposition using a low pressure hollow cathode plasma jet. The material of the cathode is pure titanium. Oxygen was introduced separately from argon through an inlet in the chamber. The nanoparticle growth mechanism is qualitatively discussed. The morphology of the surfaces of thin films was investigated by an atomic force microscope. The chemical composition of the thin films was investigated by means of an energy-dispersive x-ray analysis and x-ray photoelectron spectroscopy. A cylindrical Langmuir probe and a fiber optic thermometer was used for measurements of plasma parameters and neutral gastemperature respectively. The relationship between plasma parameters and the films' morphology is particularly explained.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GA15-00863S" target="_blank" >GA15-00863S: A study of impulse plasmatic systems for deposition of thin layers with applications in photonics</a><br>
Continuities
S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Sources Science and Technology
ISSN
0963-0252
e-ISSN
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Volume of the periodical
24
Issue of the periodical within the volume
3
Country of publishing house
GB - UNITED KINGDOM
Number of pages
10
Pages from-to
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UT code for WoS article
000356857800050
EID of the result in the Scopus database
2-s2.0-84937560008