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The deposition of titanium dioxide nanoparticles by means of a hollow cathode plasma jet in dc regime

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F15%3A10319538" target="_blank" >RIV/00216208:11320/15:10319538 - isvavai.cz</a>

  • Result on the web

    <a href="http://dx.doi.org/10.1088/0963-0252/24/3/035025" target="_blank" >http://dx.doi.org/10.1088/0963-0252/24/3/035025</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1088/0963-0252/24/3/035025" target="_blank" >10.1088/0963-0252/24/3/035025</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    The deposition of titanium dioxide nanoparticles by means of a hollow cathode plasma jet in dc regime

  • Original language description

    TiO2 nanoparticles are being investigated in this work. Nanoparticles were obtained in Ar plasma on monocrystaline Si(111) substrate by means of a gas-phase deposition using a low pressure hollow cathode plasma jet. The material of the cathode is pure titanium. Oxygen was introduced separately from argon through an inlet in the chamber. The nanoparticle growth mechanism is qualitatively discussed. The morphology of the surfaces of thin films was investigated by an atomic force microscope. The chemical composition of the thin films was investigated by means of an energy-dispersive x-ray analysis and x-ray photoelectron spectroscopy. A cylindrical Langmuir probe and a fiber optic thermometer was used for measurements of plasma parameters and neutral gastemperature respectively. The relationship between plasma parameters and the films' morphology is particularly explained.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GA15-00863S" target="_blank" >GA15-00863S: A study of impulse plasmatic systems for deposition of thin layers with applications in photonics</a><br>

  • Continuities

    S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2015

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Plasma Sources Science and Technology

  • ISSN

    0963-0252

  • e-ISSN

  • Volume of the periodical

    24

  • Issue of the periodical within the volume

    3

  • Country of publishing house

    GB - UNITED KINGDOM

  • Number of pages

    10

  • Pages from-to

  • UT code for WoS article

    000356857800050

  • EID of the result in the Scopus database

    2-s2.0-84937560008