Characterization of an unballanced magnetron for composite film (metal/C:H) deposition

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F99%3A11110005" target="_blank" >RIV/00216208:11320/99:11110005 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Characterization of an unballanced magnetron for composite film (metal/C:H) deposition

Original language description

In this paper, plasma parameters of a DC unbalanced planar magnetron applied for Mo/C:H composite film deposition are described in connection with the basic film properties. Langmuir probe (of a V shape) heated to a dark red was used for V A characteristic measurements in Ar and in a mixture of Ar and n-hexane as working gases. Floating and plasma potentials, electron temperature and concentrations were measured. Using a cold plane Langmuir electrostatic probe in the form of a small disc theradial distribution of a plasma potential and saturated ion current to the probe were determined. Using a thermocouple probe spot welded to the disc probe a heat load in the substrate plane was investigated. Also the dependence of the floating potential floating potential on pressure of the working gas and substrate temperature on the power delivered to the discharge were found. Finally, radial distribution of the composite film resistance per square and film thickness were measured and discussed.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/ME%20177" target="_blank" >ME 177: Physics of surface modified by ion cluster beams</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

1999

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Vacuum.:Technology, applications and ion physics

ISSN

0042-207X

e-ISSN

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Volume of the periodical

52

Issue of the periodical within the volume

4

Country of publishing house

GB - UNITED KINGDOM

Number of pages

6

Pages from-to

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UT code for WoS article

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EID of the result in the Scopus database

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