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Deposition of DLC:Si(O) Films in Low Pressure Discharges

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F01%3A00003099" target="_blank" >RIV/00216224:14310/01:00003099 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Deposition of DLC:Si(O) Films in Low Pressure Discharges

  • Original language description

    Study of the properties of silicon doped DLC films deposited in rf low pressure discharges. Investigation of the influence of the deposition parameters on the film properties.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2001

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Proceedings of 13th Symposium on Application of Plasma Processes

  • ISBN

    80-223-1573-7

  • ISSN

  • e-ISSN

  • Number of pages

    4

  • Pages from-to

    43

  • Publisher name

    Dept. of Plasma Physics & Inst. of Physics, Comenius University Bratislava (Slovakia)

  • Place of publication

    Bratislava (Slovakia)

  • Event location

    Bratislava (Slovakia)

  • Event date

    Jan 1, 2001

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article