Properties of reactively sputtered hard Ti(Fe)Nx films

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F03%3A00000128" target="_blank" >RIV/49777513:23520/03:00000128 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Properties of reactively sputtered hard Ti(Fe)Nx films

Original language description

Hard films are successfully used to improve functional properties of cutting tools and their lifetime. Despite this fact, new demands in machining of advance materials, however, require new films with enhanced properties to be developed. This paper reports on results of a systematic investigation of properties of thin Ti(Fe)Nx, films reactively sputtered using an unbalanced dc magnetron. Main advantages of magnetron sputtering are relatively low deposition temperatures and possibility to scale up the deposition process. Important is also the deposition rate aD of the film because it decides on its price. Therefore, this paper is devoted to aD of Ti(Fe)Nx films, their structure and mechanical properties.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/ME%20529" target="_blank" >ME 529: Nanostructured thin films</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2003

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

JUNIORMAT &#8217;03

ISBN

80-214-2462-1

ISSN

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e-ISSN

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Number of pages

4

Pages from-to

12-15

Publisher name

University of Technology

Place of publication

Brno

Event location

Brno

Event date

Sep 23, 2003

Type of event by nationality

EUR - Evropská akce

UT code for WoS article

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