Structure-hardness relations in sputtered Ti-Al-V-N films

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F03%3A00000191" target="_blank" >RIV/49777513:23520/03:00000191 - isvavai.cz</a>
Alternative codes found
RIV/49777513:23520/03:00000089 RIV/49777513:23520/03:00000090
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Structure-hardness relations in sputtered Ti-Al-V-N films
Original language description
The paper presents a detailed analysis of structure-hardness relations in hard and superhard nanostructured Ti(Al,V)Nx films with a low content of Al(5 at.%)and V(2 at.%). The Ti(Al,V)Nx films were prepared by d.c. reactive magnetron sputtering. Specialattention is devoted to the energy Epi delivered to the growing film by bombarding ions. It was found that Ti(Al,V)Nx films form a superhard material with hardness H>40 GPa; superhard Ti(Al,V)Nx films are: poly-oriented films characterized with at leas ttwo broad, low-intensity X-ray reflections, i.e. are composed of small grains of different crystallographic orientations.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
<a href="/en/project/ME%20529" target="_blank" >ME 529: Nanostructured thin films</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2003
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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