Effect of energy on structure, microstructure and mechanical properties of hard Ti(Al,V)Nx films prepared by magnetron sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43949511" target="_blank" >RIV/49777513:23520/17:43949511 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.surfcoat.2017.06.074" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2017.06.074</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.surfcoat.2017.06.074" target="_blank" >10.1016/j.surfcoat.2017.06.074</a>
Alternative languages
Result language
angličtina
Original language name
Effect of energy on structure, microstructure and mechanical properties of hard Ti(Al,V)Nx films prepared by magnetron sputtering
Original language description
The article reports on the effect of the energy E delivered to the growing film by bombarding ions Ebi and/or fast neutrals Efn on its structure, microstructure and mechanical properties, and resistance to cracking. The effect of the total delivered energy E = Ebi + Efn on the film properties is demonstrated on the Ti(Al,V)Nx films deposited by reactive magnetron sputtering. The films were sputtered on Si(111) and Mo substrates in a mixture Ar + N2 gases by a dual magnetron with closed magnetic field and equipped with TiAlV (6 at.% Al, 4 at.% V) alloy targets. It was shown that (1) The energy E is a key parameter controlling the physical and mechanical properties, and the resistance of cracking of sputtered Ti(Al,V)Nx films, (2) The structure of Ti(Al,V)Nx films varies from TiN(200) to TiN(220) with increasing energy E, (3) The Ti(Al,V)Nx films with high ratio H/E* ≥ 0.1, high elastic recovery We ≥ 60% and dense voids-free microstructure exhibit an enhanced resistance to cracking and can be produced only in the case when an sufficient energy E is delivered to the growing film either by bombarding ions Ebi or by bombarding fast neutrals Efn and (4) The energy Efn makes it possible to sputter crystalline films onto dielectric substrates held at a floating potential Us = Ufl.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films
Result continuities
Project
<a href="/en/project/LO1506" target="_blank" >LO1506: Sustainability support of the centre NTIS - New Technologies for the Information Society</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Surface and Coatings Technology
ISSN
0257-8972
e-ISSN
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Volume of the periodical
332
Issue of the periodical within the volume
25 December 2017
Country of publishing house
CH - SWITZERLAND
Number of pages
8
Pages from-to
190-197
UT code for WoS article
000418968100024
EID of the result in the Scopus database
2-s2.0-85029468463