Effect of energy on the formation of flexible hard Al-Si-N films prepared by magnetron sputtering

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F16%3A43929163" target="_blank" >RIV/49777513:23520/16:43929163 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.vacuum.2016.08.014" target="_blank" >http://dx.doi.org/10.1016/j.vacuum.2016.08.014</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2016.08.014" target="_blank" >10.1016/j.vacuum.2016.08.014</a>

Result language
angličtina
Original language name
Effect of energy on the formation of flexible hard Al-Si-N films prepared by magnetron sputtering
Original language description
The article reports on mechanical and optical properties of Al-Si-N films with a low Si content (< 5 at.%) deposited by ac pulsed reactive magnetron sputtering. The effect of the energy Ebi delivered in the growing film by bombarding ions on the properties of Al-Si-N films was investigated in detail. It was found that the Al-Si-N films are crystalline, highly elastic and optically transparent, and exhibit (i) the columnar microstructure and low resistance to cracking when sputtered at low energy Ebi, (ii) the dense, voids-free microstructure and the enhanced resistance to cracking when sputtered at high energy Ebi.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
<a href="/en/project/LO1506" target="_blank" >LO1506: Sustainability support of the centre NTIS - New Technologies for the Information Society</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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