XPS and Ellipsometric Study of DLC/silicon interface

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F01%3A00004313" target="_blank" >RIV/00216224:14310/01:00004313 - isvavai.cz</a>

Alternative codes found

RIV/00216208:11320/01:00105744

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

XPS and Ellipsometric Study of DLC/silicon interface

Original language description

Diamond-like carbon (DLC) films were prepared by plasma enhanced CVD from the mixture of methane and argon on silicon substrates. Films were characterized by multi-sample modification of variable angle spectroscopic ellipsometry. The ellipsometry showedthat there is a transition interlayer between the DLC film and the silicon substrate that cannot be attributed to a thin silicon dioxide layer but rather to amorphous silicon and/or modified oxide layer. TRIM calculations revealed that argon or carbon ions could not produce a significant layer of amorphous silicon because the depth of target atom displacements is bellow the thickness of a native oxide layer. The chemical composition of a DLC film profile including a DLC/silicon interface was studied byX-ray photoelectron spectroscopy (XPS) coupled with an argon sputtering of the 34~nm thick DLC film. The DLC/silicon interface composed from less than 6 % of oxygen and gradually decreasing and increasing carbon and silicon percentage, re

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2001

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Vacuum

ISSN

0042-207X

e-ISSN

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Volume of the periodical

61

Issue of the periodical within the volume

1

Country of publishing house

US - UNITED STATES

Number of pages

5

Pages from-to

269

UT code for WoS article

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EID of the result in the Scopus database

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