Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F01%3A00004510" target="_blank" >RIV/00216224:14310/01:00004510 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds
Original language description
Low pressure deposition of hard carbon films with addition of silicon and oxide was carried out in the mixture of methane and hexamethyldisiloxane (HMDSO). Film properties like deposition rate, hardness and optical constants depended strongly on tbe HMDSO to methane ratio. Moreover, the self bias voltage at the powered electrode, on which the substrates were placed, depended on this ratio too. Therefore, the plasma parameters were studied by OES and capacitavely coupled planar ion flux probe. It was found, that the temperatures as well as positive ion current density depended on the HMDSO to methane flow rate ratio but not on the self bias voltage that was independently changed with an external dc voltage supply.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2001
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings of 15th International Symposium on Plasma Chemistry
ISBN
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ISSN
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e-ISSN
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Number of pages
6
Pages from-to
133
Publisher name
GREMI, CNRS/University of Orleans
Place of publication
Orleans (France)
Event location
Orleans (France)
Event date
Jan 1, 2001
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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