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Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F02%3A00007050" target="_blank" >RIV/00216224:14310/02:00007050 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods

  • Original language description

    In this paper slight roughness of the upper boundaries of TiO2 thin films prepared on substrates formed by single-crystal silicon is studied. Atomic force microscopy (AFM) and an optical method based on combining variable-angle spectroscopic ellipsometryand near-normal spectroscopic reflectometry are used for this purpose. It is shown that the values of the basic statistical quantities characterizing this roughness depend quite strongly on the values of the thicknesses of these films (they increase with increasing thickness). Differences observed between the values of the basic statistical parameters determined by AFM and the optical method are explained. It is also shown that the TiO2 films exhibit an inhomogeneity represented by a profile of the complex refractive index.

  • Czech name

    Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods

  • Czech description

    In this paper slight roughness of the upper boundaries of TiO2 thin films prepared on substrates formed by single-crystal silicon is studied. Atomic force microscopy (AFM) and an optical method based on combining variable-angle spectroscopic ellipsometryand near-normal spectroscopic reflectometry are used for this purpose. It is shown that the values of the basic statistical quantities characterizing this roughness depend quite strongly on the values of the thicknesses of these films (they increase with increasing thickness). Differences observed between the values of the basic statistical parameters determined by AFM and the optical method are explained. It is also shown that the TiO2 films exhibit an inhomogeneity represented by a profile of the complex refractive index.

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BM - Solid-state physics and magnetism

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GA101%2F01%2F1104" target="_blank" >GA101/01/1104: Realisation of thelaboratory instrument for surface roughness measurement by holographic interferometry</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2002

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Surface and Interface Analysis

  • ISSN

    0142-2421

  • e-ISSN

  • Volume of the periodical

    34

  • Issue of the periodical within the volume

    1

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    4

  • Pages from-to

    759-762

  • UT code for WoS article

  • EID of the result in the Scopus database