Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F02%3A00007050" target="_blank" >RIV/00216224:14310/02:00007050 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—
Alternative languages
Result language
angličtina
Original language name
Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods
Original language description
In this paper slight roughness of the upper boundaries of TiO2 thin films prepared on substrates formed by single-crystal silicon is studied. Atomic force microscopy (AFM) and an optical method based on combining variable-angle spectroscopic ellipsometryand near-normal spectroscopic reflectometry are used for this purpose. It is shown that the values of the basic statistical quantities characterizing this roughness depend quite strongly on the values of the thicknesses of these films (they increase with increasing thickness). Differences observed between the values of the basic statistical parameters determined by AFM and the optical method are explained. It is also shown that the TiO2 films exhibit an inhomogeneity represented by a profile of the complex refractive index.
Czech name
Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods
Czech description
In this paper slight roughness of the upper boundaries of TiO2 thin films prepared on substrates formed by single-crystal silicon is studied. Atomic force microscopy (AFM) and an optical method based on combining variable-angle spectroscopic ellipsometryand near-normal spectroscopic reflectometry are used for this purpose. It is shown that the values of the basic statistical quantities characterizing this roughness depend quite strongly on the values of the thicknesses of these films (they increase with increasing thickness). Differences observed between the values of the basic statistical parameters determined by AFM and the optical method are explained. It is also shown that the TiO2 films exhibit an inhomogeneity represented by a profile of the complex refractive index.
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
—
Result continuities
Project
<a href="/en/project/GA101%2F01%2F1104" target="_blank" >GA101/01/1104: Realisation of thelaboratory instrument for surface roughness measurement by holographic interferometry</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2002
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Surface and Interface Analysis
ISSN
0142-2421
e-ISSN
—
Volume of the periodical
34
Issue of the periodical within the volume
1
Country of publishing house
US - UNITED STATES
Number of pages
4
Pages from-to
759-762
UT code for WoS article
—
EID of the result in the Scopus database
—