New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F03%3A00008288" target="_blank" >RIV/00216224:14310/03:00008288 - isvavai.cz</a>

Alternative codes found

RIV/00216305:26210/03:PU40927 RIV/00177016:_____/03:#0000324

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

Original language description

In this paper, a new optical method for characterizing thin films exhibiting area nonuniformity in optical parameters is described. This method is based on interpreting the spectral dependences of the reflectance measured using the special experimental arrangement described in detail. Using this method, the distribution of both the optical parameters, i.e. the local thickness and local refractive index, describing the thin film studied can be determined along a large area of the substrate. It is shown that the method presented can be employed for determining strong nonuniformities in the optical parameters of the films studied. The method is illustrated through the optical analysis of strongly nonuniform thin films formed by a mixture of CN_x and SiO_ydeposited onto silicon single-crystal substrates.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2003

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Japanese Journal of Applied Physics

ISSN

0021-4922

e-ISSN

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Volume of the periodical

42

Issue of the periodical within the volume

7B

Country of publishing house

JP - JAPAN

Number of pages

5

Pages from-to

4760-4765

UT code for WoS article

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EID of the result in the Scopus database

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