Preionised pulsed magnetron discharges for ionised physical vapour deposition

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F05%3A00012906" target="_blank" >RIV/00216224:14310/05:00012906 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Preionised pulsed magnetron discharges for ionised physical vapour deposition

Original language description

To improve the quality of thin film deposition by magnetron discharges, particularly by an effective ionisation of the sputtered vapour, we developed a new ionised physical vapour deposition (IPVD) method based on preionised Pulsed magnetron discharges.By superposition of continuous, microwave or RF discharge, with a fast pulsed abnormal discharge, target current density is extended to very high values during short pulses. Efficient vapour ionisation is obtained and due to the current pulse shortness,electric arc development is avoided.

Czech name

Preionizovany pulzni magnetronovy vyboj pro IPVD

Czech description

Diagnostika preionizovaneho pulzniho magnetronoveho vyboje

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/GD202%2F03%2FH162" target="_blank" >GD202/03/H162: Advanced topics in physics and chemistry of plasmas</a><br>

Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2005

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Optoelectronics and Advanced Materials

ISSN

1454-4164

e-ISSN

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Volume of the periodical

7

Issue of the periodical within the volume

5

Country of publishing house

RO - ROMANIA

Number of pages

3

Pages from-to

2481

UT code for WoS article

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EID of the result in the Scopus database

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