Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F05%3A00012907" target="_blank" >RIV/00216224:14310/05:00012907 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements

Original language description

This paper deals with the characterization of an ionized physical vapour deposition (IPVD) reactor using an additional microwave plasma. The IPVD reactor was spatially characterized using optical emission spectroscopy, optical absorption spectroscopy andLangmuir probe measurements. A rectangular titanium target was used, the buffer gas was argon and the pressure was fixed at 4 Pa. The influence of the microwave power (between 0 and 900 W) and the magnetron discharge current (0.5 and 2 A) on the densities of the titanium species (neutral and ionic), argon emission line intensity and titanium and argon temperature variations was investigated. The titanium temperature and densities were measured using the pulsed resonant absorption spectroscopy technique. The neutral and ion fluxes on the substrate were deduced from these measurements. It was found that the ratio phi(Ti+)/phi(Ti-n) increases by a factor of 30 when additional microwave plasma is used. Moreover, we point out the temperatur

Czech name

Prostorove rozlisena charakterizace IPVD reaktoru: teplota jako klicovy parametr pro interpretaci opticke emisni spektroskopie

Czech description

Studium IPVD reaktoru s Ti katodou. Teplota jako klicovy parametr pro interpretaci vysledku.

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/GD202%2F03%2FH162" target="_blank" >GD202/03/H162: Advanced topics in physics and chemistry of plasmas</a><br>

Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2005

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

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Volume of the periodical

14

Issue of the periodical within the volume

2

Country of publishing house

GB - UNITED KINGDOM

Number of pages

7

Pages from-to

321

UT code for WoS article

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EID of the result in the Scopus database

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