Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F06%3A00017371" target="_blank" >RIV/00216224:14310/06:00017371 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas
Original language description
In many applications (ophthalmic lenses, car headlights, etc.), silicon oxide films are used as protective coatings in order to improve the mechanical properties of polymers. The Plasma Enhanced Chemical Vapor Deposition (PECVD), which allows depositionof dense films at temperature near the ambient, is particularly relevant for this. In this work, SiO2-like films have been deposited in a helicon reactor operated in inductive mode at low pressure with pulsed O-2/HMDSO plasmas. The influence of the plasma-off time on the structure and mechanical properties of deposited films are studied and compared to those of the film deposited with a continuously applied power. Ellipsometric measurements and infrared spectra show that all the films are SiO2-like films, transparent from 1.5 to 5 eV and possess a refractive index (n = 1.46 at 1.95 eV) close to the thermal oxide one. Good mechanical properties are observed from the depth sensing indentations by Fischerscope tester. The plastic hardness
Czech name
Srovnání struktury SiO2-podobných vrstev deponovaných v pulzním a kontinuálním O2/HMDSO plazmatu
Czech description
Srovnání struktury SiO2-podobných vrstev deponovaných v pulzním a kontinuálním O2/HMDSO plazmatu
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2006
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Surface & coatings technology
ISSN
0257-8972
e-ISSN
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Volume of the periodical
200
Issue of the periodical within the volume
22-23
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
4
Pages from-to
6517-6521
UT code for WoS article
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EID of the result in the Scopus database
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