Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F07%3A00022272" target="_blank" >RIV/00216224:14310/07:00022272 - isvavai.cz</a>

Alternative codes found

RIV/61389005:_____/07:00097266

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties

Original language description

Thin organosilicon and silicon oxide films were deposited in r.f. capacitively coupled discharges from a mixture of hexamethyldisiloxane (HMDSO) and oxygen. The concentration of HMDSO was in the range 5-17%. Even for such relatively high dilution of HMDSO the organic-inorganic crossover of the film character was observed due to changes of the HMDSO concentration, but other factors, such as pressure and d.c. self-bias should also be taken into account. When annealed the films changed their composition, chemical structure and mechanical properties. We observed desorption of water, methane and CO or CO2 from the SiO2-like films. The hardness of the SiO2-like film, containing 5% carbon and 25% hydrogen, increased with the increase of annealing temperaturefrom 5.9 (as deposited) to 11.3 GPa (500 oC). Simultaneously, its fracture toughness was significantly improved. These effects were explained by dehydration and cross-linking of the film. However, the mechanical properties of highly cross

Czech name

Organosilikonové tenké vrstvy připravené metodou PECVD: termálně indukované změny chemické struktury a mechanických vlastností

Czech description

Tenké organosilikonové vrstvy a vrstvy oxidu křemíku byly deponovány ve v.f. kapacitně vázaném výboji ze směsi HMDSO s kyslíkem

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2007

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Physics and Chemistry of Solids

ISSN

0022-3697

e-ISSN

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Volume of the periodical

68

Issue of the periodical within the volume

1

Country of publishing house

US - UNITED STATES

Number of pages

5

Pages from-to

1255-1259

UT code for WoS article

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EID of the result in the Scopus database

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