Towards limits of x-ray specular reflectivity
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F09%3A00029733" target="_blank" >RIV/00216224:14310/09:00029733 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Towards limits of x-ray specular reflectivity
Original language description
Using the high resolution diffractometer we have successfully measured photoresist layers more than 1 um thick by x-rays. The thicknesses obtained by x-ray reflectivity correspond well to the ones obtained by optical reflection.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GA202%2F09%2F1013" target="_blank" >GA202/09/1013: Nucleation and growth of oxygen precipitates in silicon</a><br>
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Materials Structure in Chemistry, Biology, Physics and Technology
ISSN
1211-5894
e-ISSN
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Volume of the periodical
16
Issue of the periodical within the volume
2a
Country of publishing house
CZ - CZECH REPUBLIC
Number of pages
2
Pages from-to
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UT code for WoS article
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EID of the result in the Scopus database
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