Measurement of plasma potential waveform in capacitive discharge

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F09%3A00049592" target="_blank" >RIV/00216224:14310/09:00049592 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Measurement of plasma potential waveform in capacitive discharge

Original language description

The uncompensated probe was used for measurement of plasma potential waveforms. A method is presented that enables calculation of probe sheath voltage and, consequently, enables to get the plasma potential waveform by means of probe measurements. The method was successfully tested in nitrogen plasma. In order to get reliable results the method requires knowledge of plasma parameters which can be measured by a compensated Langmuir probe. It was shown that the waveforms of plasma potential and probe voltage differ significantly. Therefore, the influence of the probe sheath voltage whose calculation is presented can not be neglected by measurement of the plasma potential. At low pressure, the plasma potential waveform contained high amount of higher harmonic frequencies that were ignited namely during the fast expansion of the sheath at the powered electrode.

Czech name

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Czech description

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Type

O - Miscellaneous

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/GA202%2F07%2F1669" target="_blank" >GA202/07/1669: Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2009

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů