Probe technique for measurement of plasma potential waveform

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F17%3A00096609" target="_blank" >RIV/00216224:14310/17:00096609 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1088/1361-6595/aa6611" target="_blank" >http://dx.doi.org/10.1088/1361-6595/aa6611</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/aa6611" target="_blank" >10.1088/1361-6595/aa6611</a>

Result language

angličtina

Original language name

Probe technique for measurement of plasma potential waveform

Original language description

A method for measurement of plasma potential waveforms is presented that is based on measurement with a high-impedance probe and on an electric model of the sheath around the probe. The method was verified and compared with methods that were previously used for measurement of the temporal development of plasma potential during a RF period of capacitive discharges. Sensitivity of the method to the values of required input parameters (mean plasma potential value, electron concentration and temperature) was analyzed and it was found that with a lower precision the method can be used even without the knowledge of these input parameters. Finally, plasma potential waveforms were measured in a low-pressure capacitively coupled discharge. In agreement with theoretical models, generation of higher harmonic frequencies of plasma potential and their sensitivity to electron concentration were observed.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

<a href="/en/project/LO1411" target="_blank" >LO1411: Development of Centre for low-cost plasma and nanotechnology surface modification</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2017

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

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Volume of the periodical

26

Issue of the periodical within the volume

5

Country of publishing house

GB - UNITED KINGDOM

Number of pages

8

Pages from-to

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UT code for WoS article

000399736700001

EID of the result in the Scopus database

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