Understanding of hybrid PVD-PECVD deposition process ? titanium magnetron sputtering in argon and acetylene
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F11%3A00050094" target="_blank" >RIV/00216224:14310/11:00050094 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Understanding of hybrid PVD-PECVD deposition process ? titanium magnetron sputtering in argon and acetylene
Original language description
Hybrid PVD-PECVD process of titanium magnetron sputtering in argon and acetylene atmosphere combines aspects of both conventional techniques: sputtering of titanium target (PVD) and acetylene as a source of carbon for polymerization (PECVD). It has beenused for deposition of nanocomposite material consisting of nanocrystallites of titanium carbide embedded in hydrogenated carbon matrix (nc-TiC/a-C:H) which is an industrially attractive material for protective coatings. The aim of this contribution is to describe and understand elementary processes influencing the deposition process. Evolution of discharge voltage and current, pressure and selected spectral line intensities as a function of acetylene supply flow is reported.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů