Higher harmonic frequencies in capacitive discharges and their using for monitoring of plasma processing
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F12%3A00061370" target="_blank" >RIV/00216224:14310/12:00061370 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Higher harmonic frequencies in capacitive discharges and their using for monitoring of plasma processing
Original language description
Waveforms of discharges voltage and current and their changes due to changes of plasma parameters were studied recently. Mainly the sensitive reaction of Fourier components of discharge voltage to presence of deposited or etched thin films showed up as an useful diagnostic method of plasma processing.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/ED2.1.00%2F03.0086" target="_blank" >ED2.1.00/03.0086: Regional R&D center for low-cost plasma and nanotechnology surface modifications</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Potential and Application of Surface Nanotreatment of Polymers and Glass: Book of Extended Abstrakts 2012
ISBN
9788021059795
ISSN
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e-ISSN
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Number of pages
2
Pages from-to
124-125
Publisher name
Masaryk University
Place of publication
Brno
Event location
Brno
Event date
Jan 1, 2012
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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