CHEMICAL AND PHYSICAL EVALUATION OF HYDROPHOBIC pp-HMDSO LAYERS DEPOSITED BY PLASMA POLYMERIZATION AT ATMOSPHERIC PRESSURE
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F12%3A00064656" target="_blank" >RIV/00216224:14310/12:00064656 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
CHEMICAL AND PHYSICAL EVALUATION OF HYDROPHOBIC pp-HMDSO LAYERS DEPOSITED BY PLASMA POLYMERIZATION AT ATMOSPHERIC PRESSURE
Original language description
This work deals with plasma polymerization deposition of hydrophobic layers onto glass substrates at atmospheric pressure. The hexamethyldisiloxane (HMDSO)organosilicon monomer was used as precursor for plasma polymerization in nitrogen working gas. Theso-called Diffuse Coplanar Surface Barrier Discharge was used as a source of non-equilibrium non-thermal plasma. The pp-HMDSO thin films were studied by the means of SEM,AFM, FTIR, XPS and SIMS measurements. Our research revealed that smooth, polymer-like, hydrophobic and transparent in visible range thin films were deposited on the glass substrates. The results indicate that DCSBD discharge can be used for thin films deposition by the means of plasma polymerization process at atmospheric pressure.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/ED2.1.00%2F03.0086" target="_blank" >ED2.1.00/03.0086: Regional R&D center for low-cost plasma and nanotechnology surface modifications</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
CHEMICKÉ LISTY
ISSN
0009-2770
e-ISSN
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Volume of the periodical
106
Issue of the periodical within the volume
S
Country of publishing house
CZ - CZECH REPUBLIC
Number of pages
5
Pages from-to
1450-1454
UT code for WoS article
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EID of the result in the Scopus database
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