Determination of sputtered species densities in HIPIMS discharge by optical emission spectroscopy
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F14%3A00073767" target="_blank" >RIV/00216224:14310/14:00073767 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Determination of sputtered species densities in HIPIMS discharge by optical emission spectroscopy
Original language description
Developing of magnetron sputtering process is aiming mainly to increase ionization of sputtered particles, to improve target yield or to enhance deposition rate. HIPIMS discharge yields higher number density of ionized sputtered species than DC case. However, it is difficult to estimate absolute number densities of the sputtered species (atoms and ions) in ground and metastable states from optical emission spectroscopy, because the ground and metastable levels do not directly produce any optical signal.There has been developed variety of indirect methods, however, mainly for rare gases to obtain information about number densities of metastable levels. Our research aim is to adapt these techniques such as self-absorption or effective branching fraction[1] on conditions of HIPIMS discharge. We ran experiments on magnetron with 20 cm titanium target.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů