Automatic and robust deposition process control to grow hard nc-TiC/a-C:H coatings using industrial magnetron sputtering devices

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F14%3A00073878" target="_blank" >RIV/00216224:14310/14:00073878 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—

Result language
angličtina
Original language name
Automatic and robust deposition process control to grow hard nc-TiC/a-C:H coatings using industrial magnetron sputtering devices
Original language description
nc-TiC/a-C:H coatings consist of TiC crystallites embedded in an amorphous hydrogenated carbon matrix. Depending mainly on the chemical composition (ratio of Ti/C), the properties of these coatings can be tailored from hard coatings to tribological coatings, with low coefficients of friction and wear. However none of the major industrial coating centers offer this coating in their portfolio, probably because of the lack of the reliable deposition technology. In our research, we employed industrial PVD device of Platit equipped with a central titanium rotating cylindrical cathode. Titanium was sputtered in a mixture of argon and acetylene. When the acetylene supply was gradually increased, deposition process characteristics such as the cathode voltage and the total pressure in the deposition chamber underwent a sudden change. At critical acetylene supply, a sudden drop in the cathode voltage was observed, while before and after the drop, the cathode voltage evolved slowly.
Czech name
—
Czech description
—

Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Similar results(10)