PREPARATION OF PPHMDSO THIN FILMS IN CAPACITIVELY COUPLED RF GLOW DISCHARGES UNDER DUSTY PLASMA CONDITIONS

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F18%3A00108254" target="_blank" >RIV/00216224:14310/18:00108254 - isvavai.cz</a>
Result on the web
<a href="https://invenio.nusl.cz/record/387685" target="_blank" >https://invenio.nusl.cz/record/387685</a>
DOI - Digital Object Identifier
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Result language
angličtina
Original language name
PREPARATION OF PPHMDSO THIN FILMS IN CAPACITIVELY COUPLED RF GLOW DISCHARGES UNDER DUSTY PLASMA CONDITIONS
Original language description
The deposition of organosilicone thin films from mixture of hexamethyldisiloxane (HMDSO) and oxygen by using capacitively coupled R.F. glow discharges under dusty plasma conditions was investigated. High resolution topography and mechanical property maps of the prepared films were acquired by using atomic force microscopy techniques. The chemical bond and composition of the deposited films were analyzed by Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). The mechanical properties of the films were studied using quasistatic as well as dynamic nanoindentation tests and their surface free energies were evaluated by means of contact angle measuring technique using several testing liquids exhibiting various surface tensions. The thermal stability of the films was studied using thermal desorption spectroscopy. Neural network modelling was used to study the effect of plasma parameters on the hardness of ppHMDSO films.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
9TH INTERNATIONAL CONFERENCE ON NANOMATERIALS - RESEARCH & APPLICATION (NANOCON 2017)
ISBN
9788087294819
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
831-835
Publisher name
TANGER LTD
Place of publication
SLEZSKA
Event location
Brno, CZECH REPUBLIC
Event date
Oct 18, 2017
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000452823300138

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