Comparison of HMDSO and HMDSZ thin films growth under dusty plasma conditions

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F21%3A00119592" target="_blank" >RIV/00216224:14310/21:00119592 - isvavai.cz</a>
Result on the web
<a href="https://www.confer.cz/nanocon/2020/3778-comparison-of-hmdso-and-hmdsz-thin-films-growth-under-dusty-plasma-conditions" target="_blank" >https://www.confer.cz/nanocon/2020/3778-comparison-of-hmdso-and-hmdsz-thin-films-growth-under-dusty-plasma-conditions</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.37904/nanocon.2020.3778" target="_blank" >10.37904/nanocon.2020.3778</a>

Result language
angličtina
Original language name
Comparison of HMDSO and HMDSZ thin films growth under dusty plasma conditions
Original language description
The present study is focused on the preparation of thin films by plasma enhanced chemical vapor deposition (PEDCV) in capacitively coupled plasma (CCP). Thin films were deposited from a mixture of oxygen and hexamethyldisiloxane (HMDSO) or hexamethyldisilazane (HMDSZ). Both monomers are well known and enable to prepare films with excellent properties such as high hardness, good abrasion resistance, hydrophobicity, and antibacterial properties. Also, these monomers are known for the creation of complex structures in plasma. This phenomenon is so-called dusty plasma. The main aim of the present work was to prepare a comparative study on the dust formation in both monomers. Complex study of surface and mechanical properties and chemical composition was done by a wide range of analytical instruments such as atomic force microscopy (AFM), nanoindentation technique, confocal microscopy, infrared spectroscopy with Fourier transformation (FTIR), stylus profilometer, and surface energy evaluation system (SEE system).
Czech name
—
Czech description
—

Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
12th International Conference on Nanomaterials - Research and Application, NANOCON 2020
ISBN
9788087294987
ISSN
2694-930X
e-ISSN
—
Number of pages
6
Pages from-to
541-546
Publisher name
TANGER Ltd.
Place of publication
Ostrava
Event location
Brno, CZECH REPUBLIC
Event date
Oct 21, 2020
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000664505500092

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