Electric signals measured during plasma thin-film etching and their connection to the electron concentration and the properties of the treated surface
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F22%3A00119623" target="_blank" >RIV/00216224:14310/22:00119623 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1088/1361-6595/ac4e23" target="_blank" >https://doi.org/10.1088/1361-6595/ac4e23</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/1361-6595/ac4e23" target="_blank" >10.1088/1361-6595/ac4e23</a>
Alternative languages
Result language
angličtina
Original language name
Electric signals measured during plasma thin-film etching and their connection to the electron concentration and the properties of the treated surface
Original language description
Electric characteristics of a discharge are usually changed when a thin film is deposited on or etched from a discharge electrode or a substrate. The electric characteristics include plasma potential, discharge voltage and discharge current, including higher harmonic frequencies of these quantities. This fact can be used for monitoring of various plasma processes, but the mechanism in which the thin film influences the electric characteristics of discharge has not been fully clarified. This work verifies on the example of etching of diamond-like carbon films that variations of electric discharge parameters are caused by variations of electron concentration, which is caused by a difference of the electron emission yield between the DLC film and its substrate.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Sources Science and Technology
ISSN
0963-0252
e-ISSN
1361-6595
Volume of the periodical
31
Issue of the periodical within the volume
3
Country of publishing house
GB - UNITED KINGDOM
Number of pages
6
Pages from-to
1-6
UT code for WoS article
000776450100001
EID of the result in the Scopus database
2-s2.0-85128375427