Millisecond X-ray reflectometry and neural network analysis: unveiling fast processes in spin coating

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F24%3A00135826" target="_blank" >RIV/00216224:14310/24:00135826 - isvavai.cz</a>

Result on the web

<a href="https://journals.iucr.org/j/issues/2024/02/00/jo5099/index.html" target="_blank" >https://journals.iucr.org/j/issues/2024/02/00/jo5099/index.html</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1107/S1600576724001171" target="_blank" >10.1107/S1600576724001171</a>

Result language

angličtina

Original language name

Millisecond X-ray reflectometry and neural network analysis: unveiling fast processes in spin coating

Original language description

X-ray reflectometry (XRR) is a powerful tool for probing the structural characteristics of nanoscale films and layered structures, which is an important field of nanotechnology and is often used in semiconductor and optics manufacturing. This study introduces a novel approach for conducting quantitative high-resolution millisecond monochromatic XRR measurements. This is an order of magnitude faster than in previously published work. Quick XRR (qXRR) enables real time and in situ monitoring of nanoscale processes such as thin film formation during spin coating. A record qXRR acquisition time of 1.4 ms is demonstrated for a static gold thin film on a silicon sample. As a second example of this novel approach, dynamic in situ measurements are performed during PMMA spin coating onto silicon wafers and fast fitting of XRR curves using machine learning is demonstrated. This investigation primarily focuses on the evolution of film structure and surface morphology, resolving for the first time with qXRR the initial film thinning via mass transport and also shedding light on later thinning via solvent evaporation. This innovative millisecond qXRR technique is of significance for in situ studies of thin film deposition. It addresses the challenge of following intrinsically fast processes, such as thin film growth of high deposition rate or spin coating. Beyond thin film growth processes, millisecond XRR has implications for resolving fast structural changes such as photostriction or diffusion processes.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2024

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Applied Crystallography

ISSN

1600-5767

e-ISSN

—

Volume of the periodical

57

Issue of the periodical within the volume

2

Country of publishing house

GB - UNITED KINGDOM

Number of pages

10

Pages from-to

314-323

UT code for WoS article

001208800100011

EID of the result in the Scopus database

2-s2.0-85189944139