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In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe-Ni alloy substrate for photovoltaic applications

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27350%2F14%3A86090046" target="_blank" >RIV/61989100:27350/14:86090046 - isvavai.cz</a>

  • Alternative codes found

    RIV/61989100:27740/14:86090046 RIV/61989100:27640/14:86090046

  • Result on the web

    <a href="http://www.sciencedirect.com/science/article/pii/S0040609014006531" target="_blank" >http://www.sciencedirect.com/science/article/pii/S0040609014006531</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.tsf.2014.06.009" target="_blank" >10.1016/j.tsf.2014.06.009</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe-Ni alloy substrate for photovoltaic applications

  • Original language description

    Crystallinity and material quality of hydrogenated microcrystalline silicon (?c-Si:H) films change during their growth, leading to a complex material structure. In order to identify the composition of those inhomogeneous films, deposited on iron-nickel (Fe-Ni) alloy substrates, in-situ ellipsometric data were taken during the thin film growth at regular time intervals. The analysis of the in-situ data taken at the photon energy range between 2.8 and 4.5 eV allowed us to identify the composition of the thin film surface as it grows. The time evolution of the crystalline and amorphous silicon fractions and the surface roughness shows clearly three important phases of the thin film growth: the initial growth of nanocone shaped crystals, the collision phase of neighboring crystals, and the semi-homogeneous material growth until the end of the deposition. The analysis of in-situ data taken during depositions on three different Fe-Ni alloy substrates with different crystal sizes and surface

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BH - Optics, masers and lasers

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/ED1.1.00%2F02.0070" target="_blank" >ED1.1.00/02.0070: IT4Innovations Centre of Excellence</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2014

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Thin Solid Films

  • ISSN

    0040-6090

  • e-ISSN

  • Volume of the periodical

    571

  • Issue of the periodical within the volume

    Neuvedeno

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    7

  • Pages from-to

    749-755

  • UT code for WoS article

    000346055200078

  • EID of the result in the Scopus database