Amorphous Ge-As-Te thin films prepared by Pulsed Laser Deposition - A photostability study
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F15%3A39899853" target="_blank" >RIV/00216275:25310/15:39899853 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.5220/0005338301030107" target="_blank" >http://dx.doi.org/10.5220/0005338301030107</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.5220/0005338301030107" target="_blank" >10.5220/0005338301030107</a>
Alternative languages
Result language
angličtina
Original language name
Amorphous Ge-As-Te thin films prepared by Pulsed Laser Deposition - A photostability study
Original language description
Pulsed laser deposition was used for the fabrication of amorphous thin films from Ge-As-Te system with the aim to study their intrinsic photostability. Photostability of prepared layers was studied using spectroscopic ellipsometry within as-deposited aswell as relaxed layers. For irradiation, laser sources operating at three energies (1.17, 0.92 and 0.8 eV) in band gap region of the studied materials were employed. The lowest values of photorefraction (refractive index changes) accompanied with lowestchanges of band gap values present Ge20As20Te60 thin films, which are therefore considered as the layers with highest photostability, especially in relaxed state.
Czech name
—
Czech description
—
Classification
Type
D - Article in proceedings
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
—
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
PHOTOPTICS 2015, Proceedings of the 3rd International Conference on Photonics, Optics and Laser Technology, Volume 1
ISBN
978-989-758-092-5
ISSN
—
e-ISSN
—
Number of pages
5
Pages from-to
103-107
Publisher name
SciTePress - Science and Technology Publications
Place of publication
Porto
Event location
Berlin
Event date
Mar 12, 2015
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
—