Etching of Microstructures and Modification of Solid Surfaces by Low Energy Ion Beams

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26210%2F00%3A00000265" target="_blank" >RIV/00216305:26210/00:00000265 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Etching of Microstructures and Modification of Solid Surfaces by Low Energy Ion Beams

Original language description

The etching ability of low energy Ar ions to produce microstructures in Si and Ag substrates and to modify surfaces of refractory materials like ceramics was proved. The microstructures with pattern heights up to 90 nm (Si) and 300 nm (Ag) were created.Despite relatively low energies of ions, interesting significant ion-beam induced modifications of alumina surfaces were found.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2000

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

Micro Materials - Micro Mat 2000, Berlin

ISBN

3-932434-15-3

ISSN

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e-ISSN

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Number of pages

4

Pages from-to

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Publisher name

Micro Materials - Micro Mat 2000, Berlin

Place of publication

Berlín, SNR

Event location

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Event date

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Type of event by nationality

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UT code for WoS article

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