Current density distribution, noise and non-linearity of thick film resistors
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F03%3APU40392" target="_blank" >RIV/00216305:26220/03:PU40392 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Current density distribution, noise and non-linearity of thick film resistors
Original language description
The noise spectroscopy and third harmonic measurements were used to investigate effect of the contact electrode material on the thick film resistor quality and reliability. Strong dependence of nonlinearity on the contact electrode material wasobserved.Thick film resistors with AgPd contactelectrode have higher value of third harmonic voltage,but show better long term stability and reliabilitycomparing with resistors with Ag contact electrode.From the SEM figures we determined, that the sharpness of AggPd contact electrode is approximately 7deg, while Ag contact electrode sharpness is approx. 12deg. It was proved experimentally that noise spectraldensity is proportional to electric field intensity, whilethird harmonic voltage depends on the third power ofelectric field intensity or current density. Modelling ofthe current distribution for two different shapes of metallic contact cross sections was performed. The model shows that the electrode geometry plays dominant role for current d
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2003
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Capacitor and Resistor Technology
ISSN
0887-7491
e-ISSN
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Volume of the periodical
2003
Issue of the periodical within the volume
4
Country of publishing house
US - UNITED STATES
Number of pages
5
Pages from-to
112-116
UT code for WoS article
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EID of the result in the Scopus database
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